K500X K550X离子溅射镀膜仪(喷金机)

英国Quorum/Emitech溅射离子镀膜仪作为世界顶级制样设备,在电子显微镜(扫描电镜透射电镜)的样品制备领域中应用非常广泛。
特点
•低电压溅射
•高分辨率精细涂层(金颗粒达2 nm)
•均匀厚度沉积(扫描电镜一般厚度为20nm 或200A)
•165 mm(6英寸)腔室
•无需冷却样品台
•精确的再次涂层
•膜厚度重复性好
•容易装载或卸载样品
•可预设沉积厚度
仪器性能指标
1.Instrument Case - 450mm W x 350mm D x 175mm H 仪器尺寸450mm W x 350mm D x 175mm H
2.Work Chamber - Borosilicate Glass 165mm Dia x 125mm H
工作腔室-硼硅酸盐玻璃 165mm Dia x 125mm H
3.Safety Shield – Polycarbonate 安全钟罩-聚碳酸酯
4.Weight - 18Kg 重量-18公斤
5.Target - 60mm Dia x 0.1mm Thick (Gold fitted as Standard) 靶-60 mm 直径 x 0.1mm 厚(金作为标准靶面)
6.Specimen Stage - 60mm Dia. 样品台-60 mm直径
7.Vacuum Gauge Range - ATM - 1x10-2 mbar 真空范围-ATM-1x10-2 mbar
8.Deposition Range - 0-50mA 沉积电流范围-0-50mA
9.Deposition Rate - 0-25nm/Minute 沉积速率-0-25nm/分
10.Sputter Timer - 0-4 minutes 溅射时间- 0-4 分钟
11.Pre-set Needle Valve - Control of Argon Supply 预设置针阀-控制氩
12.Electrical Supply - 230 Volts 50Hz (10 amp max. including Pump)
电源-230 伏 50Hz (10 amp max. including Pump)
K500和K550的区别
K500:without rotating stage.(无旋转台、自动控制)
K550:Fully Automatic Control(全自动控制)