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Wafer Numbers / Sizes
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(80 -10) pcs / (2"- 6")
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Sputter Cathodes
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Up to 4 sets (Option)
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Power Suppliers
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DC, Pulsed-DC or RF (Option)
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Ultimate Pressure
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< 5E-7 Torr
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Based Pressure
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5E-6 Torr within 30 mins
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Pumping System
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Turbomolecular Pump + Rotary Pump or
Cryopump + Dry pump (Option) |
Automatic Control System
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Industrial HMI with Graphic User Interface
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Substrate Temperature Control
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RT ~ 350℃
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Non-Uniformity
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5% for WIW, WTW and RTR
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Power Requirement
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AC220V, 3 phase, 60 Hz, 100A,
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Dry N2 Requirement
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1.2 kgw/cm2
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CDA Requirement
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5 kgw/cm2
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Water Requirement
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1.5 kgw/cm2, 20。, 40 l/min
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Dimension (WxDxH)
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1300 x 900 x 1800 (mm)
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Weight
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700 kgw
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