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IPNR-T1000 | Thermal plastic nanoimprint resist 热塑型纳米压印胶 |
IPNR-T2000 | Thermal curable nanoimprint resist 热固化型纳米压印胶 |
IPNR-PC1000 | Photo-curable nanoimprint resist (Free radical initiation) 光固化型纳米压印胶(自由基引发) |
IPNR-PC2000 |
Photo-curable nanoimprint resist (cation intiation) 光固化型纳米压印胶(阳离子引发) |
IPNR-UL1000 | Under-layer polymer for lift off process 举离型传递层材料 |
IPNR-UL2000 | Under-layer polymer etching mask process 刻蚀型传递层材料 |
IPNR-UPM | Quick mold fabrication material 快速模板制作材料 |
IPNR-AP | Chlorosilane based adhesion promoter 氯硅烷增粘剂 |
主要特点:
IPNR-T1000 Thermoplastic nanoimprint resist
热塑型纳米压印胶
? Sub-10 nm resolution 分辨率低于10nm
? Low imprint pressure (< 20 bar) 低压力压印(< 20 bar)
? Low imprint temperature (< 100 ℃) 低温压力(< 100 ℃)
IPNR-T2000 Thermal curable nanoimprint resist
热固化型纳米压印胶
? Sub-10 nm resolution 分辨率低于10nm
? Low imprint pressure (< 1 bar) and Low curing temperature (< 100 ℃) 低压力压印(< 1 bar)以及低固化温度(< 100 ℃)
? Short thermal curing time (< 60 s) 热固化时间短(< 60 s)
? High O2 Plasma etching resistance 高氧等离子体刻蚀电阻
? Uniform film thickness 均一的膜厚度
IPNR-PC1000 Photo-curable nanoimprint resist (Free radical initiation)
光固化型纳米压印(自由基引发)
? Acrylate functionalized polysiloxane based resist 丙烯酸酯官能化聚硅氧烷抗蚀剂
? Vacuum or Nitrogen atmosphere operation 真空或者氮气气氛下操作
? Sub-10 nm resolution 低于10nm的分辨率
? Low imprint pressure (< 1 bar) and ultra-fast curing time (< 10 s) 低压力压印以及超快固化时间(< 10 s)
? Low UV-exposure dose 低紫外照射量
? High O2 Plasma etching resistance 高氧等离子体刻蚀电阻
? Uniform film thickness 均一的膜厚度
IPNR-PC2000 Photo-curable nanoimprint resist (cation intiation)
光固化纳米压印蚀剂(阳离子引发)
? Vinyl ether functionalized polysiloxane based resist 乙烯基醚官能化聚硅氧烷抗蚀剂
? Air atmosphere operation 空气气氛下操作
? Sub-10 nm resolution 分辨率低于10nm
? Low imprint pressure (< 1 bar) and ultra-fast curing time (< 1 bar) 低压力压印(< 1 bar)以及超快固化时间(< 1 bar)
? Low UV-exposure dose 低紫外照射量
? High O2 Plasma etching resistance 高氧等离子体刻蚀电阻
? Uniform film thickness 均一的膜厚度
IPNR-UL1000 Under-layer polymer
举离型传递层材料
? Thermoplastic polymer for lift off process 热塑聚合物发送过程
? Strong adhesion to up layer resists and substrates 强粘附抗蚀剂层以及材料
IPNR-UL2000 Under-layer polymer
刻蚀型传递层材料
? Thermoset polymer for etching mask process 热固性聚合物刻蚀面罩过程
? Strong adhesion to up layer resists and substrates 强粘附抗蚀剂层以及材料
IPNR-UPM Quick mold fabrication material
快速模板制作材料
? Quick and easy mold fabrication 快速而简单的塑造材料
? High resolution and low cost 高分辨率以及低成本
? Superb chemical and temperature resistance 极好的化学性以耐温性
? Excellent adhesion to mold substrate 塑造优良的附着力基板
? Reliable mold release property 可靠的脱模性
IPNR-AP Chlorosilane based adhesion promoter
氯硅烷增粘剂
? Promoting adhesion between resists and substrates 促进和基材之间的附着力
? Vapor phase or solution processing 气相或者液相处理
- 询价产品:纳米压印胶 纳米压印胶
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