法国Annealsys SprayCVD设备 型号050
用于新工艺研发的2 ″实验室CVD设备、采用相同反应器的喷雾CVD
应用:用于太阳能电池的氧化,镀制半导体,电光镀膜,绝缘层镀膜,超导体,固体氧化燃料电池膜层
设备应用:
用于镀制——
• Solar Cells: SnO2, ZnO, TiO2, In2O3,…
•太阳能电池: SnO2, ZnO, TiO2, In2O3,…
• Electro-optic coatings: NiO, Co3O4,…
•电光镀膜: NiO, Co3O4,…
• Ferroelectric memories: SrTiO3,…
•铁电物质记忆: SrTiO3,…
• Insulating barrier layers: MgO,…
•绝缘层膜层: MgO,…
• Catalytically active coatings: Co3O4 , NiCo2O4,…
•催化活性镀膜: Co3O4 , NiCo2O4,…
• Semiconductors: Nb2O5,…
•半导体: Nb2O5,…
• Superconductors: YBCO,…
•超导体: YBCO,…
• Electrochromic coatings: WO3,….
•电镀镀膜: WO3,….
• Solid oxide fuel cell (SOFC): ZrO2, YSZ, GCO,…
•固体氧化燃料电池(SOFC): ZrO2, YSZ, GCO,…
主要特性
• Horizontal quartz tube with stainless steel flanges
•配有不锈钢法兰的水平石英管
• Lamp furnace for process up to 1200℃
•用于工艺的灯炉,最高至1200℃
• Thermocouple control with PID temperature controller
•热电偶控制PID温度控制器
• Kemstream Atokit for atomization of precursor
• Kemstream Atokit 用于源的雾化
• PC control with Ethernet communication
•配有以太网通讯的PC控制
PC设备完全控制软件
Access modes:
进入模式:
• Operator, Engineer, Administrator
•操作员,工程师,管理员
Recipe mode:
程序模式:
• Up to 100 steps per recipe
•每个程序最多100个步骤
• TC and pyrometer calibration associated to recipe
•TC和高温计校准与程序相关联
• PID table associated to recipe
•PID表格与程序关联
Process:
工艺:
• Full data logging
•全部数据记录
• All data and table saved in process historical
•所有数据和表格储存在工艺历史记录中
Manual mode:
手动模式:
• Manual control of heating, vacuum and gas
•手动控制加热,真空和气体
• Autotuning procedure
•自动调谐程序
Configuration mode:
配置模式:
• Mass flow ranges, calibration tables, alarm values…
•质量流量范围,校准表格,报警值…