法国Annealsys

法国Annealsys LPCVD 低压化学气相沉积设备，,提供LC100单管和LC102双管2种配置的选择。完全PC软件控制，4英寸LPCVD批量生产退火炉。应用于长二氧化硅，非晶硅，多晶硅膜等工艺。LC100和LC102致力于R&D应用广泛。

应用

• LPCVD processes

•LPCVD工艺

• Poly silicon deposition

•多晶硅沉淀

• Low stress silicon Nitride deposition

•低应力氮化硅沉淀

• Silicon dioxide deposition

•二氧化硅沉淀

• Annealing

•退火

• Oxidation

•氧化

• Etc.

•等等
The LC100 and LC102 are flexible tools dedicated to R&D
LC100和LC102致力于R&D应用广泛
They can be customized upon request for special applications
设备经需求可提供客户定制的特殊应用

设备特性

• Multi-zone resistor furnace with LPCVD capability

•多区电阻炉退火炉具备LPCVD性能

• Quartz tube with stainless steel flanges

•石英管配有不锈钢法兰

• Digital PID temperature controllers

•数字PID温度控制器

• Thermocouple control

•热电偶

• Atmospheric and vacuum process capability
大气和真空工艺性能

• Pressure control with throttle valve

•配有节流阀的压力控制

• Purge gas line with needle valve

•配有针阀的吹扫气路

• Up to 12 process gas lines with digital MFC

•最多12条配有数字MFC的工艺气路

• Double tube version (LC102) to avoid cross contamination

•双管版本（LP102）避免交叉污染

• PC control with Ethernet communication for fast data logging

•配有以太网通讯的PC控制用于快速数据记录

• Optional turbo pump

•可选配涡轮泵

PC完全控制软件