单源

laboratory-scale vacuum process systems for R&D and education
实验室规模真空工艺设备用于研发和教学

-    many application fields (coating, annealing, etching,..)
     in:
-    多领域应用（镀膜，退火，刻蚀...）
• Semiconductor
• 半导体
• Sensor
• 传感器
• MEMS
• 微型机电系统
• Optics
• 光学
• PV
• 光伏
• Automotive
• 自动化
-   low invest costs
-     低投资
-   low running costs
-   低运营成本
-   compact design
-   完美的设计
-   easy operability
-   便于操作
-   easy service and great accessibility of all components
-   所有部件便于维护和维修

FHR.Micro.200-MonoPVD
classic version
经典版
[single source sputter tool]
单源溅射设备
-    small size and compact design
-    简洁小巧的设计
-    aluminum process chamber
-    铝制工艺腔室
-    fix substrate holder for substrates up to ø200mm
-    固定的基片托可用于最大ø200mm基片
-    static sputter process at room temperature in DC-
power mode
-    DC电源模式室温下静止溅射过程
-    source target diameter 200mm
-    源靶材直径200mm
-    manually operation
-    手动操作
options
可选配置
-    sputter process in RF-power mode
-    RF-电源模式溅射工艺
-    substrate stage heater
-    基片阶段加热器
coating materials
镀膜材料
-    conductive materials, for example Cr, Cu, Au, Ag,….
-    导电材料，如： Cr, Cu, Au, Ag,…
-    for RF-power mode: Al₂O₃, SiO₂,…..
-    RF-电源模式: Al₂O₃, SiO₂,…..